Faculty of Science list:-

BAS 100B Electrochemical Workstation
Denton Discovery-18 Sputtering System
Hydro/solvothermal synthesis assembly
JEOL JEM 3010 TEM
Leybold Vacuum Univex 300 E-beam Evaporation System
Microwave plasma chemical vapor deposition (CVD) system
NanoMan Atomic Force Microscopy (AFM)
Omicron Multiprobe XP/UHV AFM/STM with Scala
Scanning Electrochemical Microscopy (SECM)

Charges for NUSNNI Equipment usage (with effect from 12 April 2006)

Specifications:
3 x 10-6 torr base vacuum
Maximum 6.0 KeV beam energy
3.6 KW power supply

Applications:
Deposition of thin films, micro/nanoparticles
Targets: Ni, Ag, Cr, Ti, Fe, Au

Charges: (For all bookings, minimum booking is 1 day)
Training cost for all new users (per session)
S$100

Operate by Trained User
NUSNNI assoc - S$40/day
NUS assoc - S$100/day

Operate by NUSNNI Staff
NUSNNI assoc - S$120/day
NUS assoc - S$200/day
Outside NUS - S$400/day
 

Denton Discovery-18 Sputtering System

Specifications:
3 cathodes, 2 RF and 1 DC
Able to do RF and DC co-sputtering
3E-7 Torr base pressure
5% film uniformity within 6” wafer
Process gases – Argon and Nitrogen

Applications:
Deposition of nano/micro thin films/catalysts
Co-sputtering of different targets
Targets: SiO2, Al, Au, Fe, Ni, Ti, Si, Co

Charges: (For all bookings, minimum booking is 1 day)
Training cost for all new users (per session)
S$100

Operate by Trained User
NUSNNI assoc - S$40/day
NUS assoc - S$100/day

Operate by NUSNNI Staff
NUSNNI assoc - S$120/day
NUS assoc - S$200/day
Outside NUS - S$400/day
 

Applications:
Atomic scale structure identification
Surface superstructure characterization
Deposition of ultrathin films

BAS 100B Electrochemical Workstation

Specifications:
Voltage range: -3.276-3.276V
Resolution: 0.1 mV

Applications:
Electrochemical measurements for
sensors, biosensors (eg. DNA, redox
active proteins, HIV, etc.)
Nanomaterials (create nanoparticles with
different sizes, characterization of polymers)
Electrodes: Ir, Pt, Pd, Ru

Specifications:
Heating temperature = 300°C
Autoclave working pressure = 120 atm

Applications:
High pressure and low temperature
synthesis of nanostructured materials

Specifications:
Accelerating voltage: 300kV
Vacuum: 10E-05 Pa order
Magnifications: 4,000 to 1,200,000 times
High resolution: lattice image at 0.14 nm
Specimen heating and cooling options
Equiped with EDX system and CCD camera

Applications:
Micro-area elemental analysis and electron
diffraction
Observation of atomic arrays
Useful for microstructural studies of fine particles,
composites and nanostructured materials

Specifications:
DI Nanoscope IV controller; DI Dimension 3100 scan head; XY-closed loop;
Newly developed nanolithography software; Ambient operation.

Applications:
Tapping mode, contact mode imaging; Magnetic force microscopy (MFM);
Fast scan imaging (up to 10 Hz scan rate); Liquid cell module;
STM & nanolithography applications.

Charges: (For all bookings, minimum booking is 1 hour)
Training cost for all new users (per session)
S$20

Operate by Trained User
NUSNNI assoc - S$10/hr
NUS assoc - S$20/hr

Operate by NUSNNI Staff
NUSNNI assoc - S$20/hr
NUS assoc - S$30/hr
Outside NUS - S$50/hr
 

Location:
Blk S7, #01-28A

Specifications:
1.5 KW operational power
5.5 KW PED available as source or reactor
Up to 2 inch substrate diameter
Operate with an unmagnetized plasma at high plasma
pressure (e.g. 100 Torr) or with a magnetized plasma
at low plasma pressure (e.g. 1 mTorr).
Up to six gas connections avalaible.
Substrate temperature controlled by the plasma
pressure and plasma power

Applications:
Growth of various nanostructures of different materials:carbon nanotubes, oxide nanosheet, nanowalls, etc.

Location:
Blk S7, #01-28A

Specifications:
Motors: dc p.i.d servo with linear position encoder,
x,y,z scan range: 70x70x70 mm,
Maximum probe step resolution: 0.1 micro.
Operating temperature: 10 ~ 25 C

Applications:
Electrochemical measurements such as cyclic voltammetry, etc.
Imaging of surface conductivity/electrochemical activity with micro or submicro resolution using ultramicroelectrodes (UMEs).
Surface modification (e.g. deposition of metal, oxide and polymers) using UMEs.