Introduction
This joint lab was established to promote
multidisciplinary research in nanoscience and materials science.
The lab houses research facilities such as:-
NanoMan Atomic Force Mcroscopy (AFM)
Microwave plasma chemical vapor deposition (CVD) system
Scanning Electrochemical Microscopy (SECM)
Pulse Laser Deposition (PLD)
Fourier Transform Infrared Spectrophotometer (FTIR)
Dynamic Mechanical Analyzer (DMA)
High Performance Liquid
Chromatograph (HPLC)
Profile Meter
On-going research projects
NanoMan Atomic Force Mcroscopy (AFM)
Specifications:
DI Nanoscope IV
controller;
DI Dimension
3100 scan hea;
XY-closed loop;
Newly developed
nanolithography software;
Ambient
operation.
Applications:
Tapping mode,
contact mode imaging;
Magnetic force
microscopy (MFM);
Fast scan
imaging (up to 10 Hz scan rate);
Liquid cell
module;
STM &
nanolithography applications.
Microwave plasma chemical vapor deposition (CVD) system
Specifications:
1.5 KW operational power;
5.5 KW PED available as source or reactor;
Up to 2 inch substrate diameter;
Operate with
an unmagnetized plasma at high plasma pressure (e.g. 100 Torr)
or with a magnetized plasma at low plasma pressure (e.g. 1 mTorr);
Up to six gas
connections avalaible;
Substrate
temperature controlled by the plasma pressure and plasma power;
Applications:
Growth of various nanostructures of different
materials: carbon nanotubes, oxide nanosheet, nanowalls, etc.
Scanning Electrochemical Microscopy (SECM)
Specifications:
Motors: dc
p.i.d servo with linear position encoder;
x,y,z scan
range: 70x70x70 mm;
Maximum probe
step resolution: 0.1 micro;
Operating
temperature: 10 ~ 25 o C
Applications:
Electrochemical
measurements such as cyclic voltammetry;
Imaging of
surface conductivity or electrochemical activity with micro or
submicro resolution using ultramicroelectrodes (UMEs);
Surface
modification (e.g. deposition of meta l,
Pulse Laser Deposition (PLD)
Specifications:
Excimer KrF pulsed laser (wavelength: 248 nm)
Maximum pulse energy: 650 mJ
Deposition temperature: room-temp. to 1050 ° C (heater)
Vacuum:
1*10-7 torr
Applications:
Ultra high vacuum system
Deposition of magnetic composite materials and
growth of thin films
Fourier Transform Infrared Spectrophotometer (FTIR)
Specifications:
Two beam
splitters: standard(KBr), 350~7800 cm-1 ;
low wavenumber (CsI), 240~5000 cm -1;
Infrared
Microscope: resolution at 1um (X, Y axes);
Two modes:
tranmission & Reflection
Applications:
Component
characterization for various materials (including bulk, thin
film, and small area
samples).
Dynamic Mechanical Analyzer (DMA)
Specifications:
Measurement temperature: 150°C~600°C; Four clamps: dual/single cantilever; film/fiber tension; shear sandwich, compression clamp; Modulus Precision: +/- 1%;Strain Resolution: 1 nm.
Applications:
Modulus
measurement for various materials;
Glass
transformation temperature measurement.
High Performance Liquid
Chromatograph (HPLC) Specifications:
- Diode array detector
- Photodiode array UV-VIS detector
- Refractive index detector
- Evaporative light scattering detector
Applications:
Chemical component characterization;
Molecular weight measurement
Profile Meter
Specifications:
Vertical
Resolution: 1
Horizontal
Resolution: 0.01 um (at 2 um/s scan speed)
Applications:
High-resolution
thickness measurement;
Profile
observation of sample surface
On-going research projects:
AFM based nanolithography and
nanocharacterization: using AFM probe to transfer functional molecules
(ink) to the substrate for the fabrication of electrical and
biological devices; using probe induced oxidation to fabricate
nanoscale oxide patterns on conducting surfaces; using conducting AFM
to investigate the local electrical properties of nanoscle structured
materials.
MW CVD growth of various nanostructured
materials including carbon nanotubes, MoS2 nanosheet and nanowalls, BN
nanotubes and nanofilms, etc.
PLD
deposition of magnetic nanocomposites for the preparation of magnetic
materials including Ni, Co and ferrite hybrids.
